Skip to content
Reference Project
Menu
  • DISSEMINATION
    • Scientific events
    • Workshops
    • Education, IP & Standards
    • Press releases
  • REFERENCE
  • GALLERY
  • TEAM
  • CONTACT

Month: February 2017

IP & Standards

FR1751296

Masking area of a donor substrate during an ion implantation step

IP & Standards

FR17/51413

RF SOI Structure comprising a carbon layer

IP & Standards

F17/0103CVE

Substrat pour un dispositif intégré radiofréquence et son procédé de fabrication

Recent Posts

  • 1 MSc selected
  • IP Sentronics
  • IP Sentronics
  • IEEE Int. Conf. SMACD
  • 1 PhD

Recent Comments

    Archives

    • June 2018
    • April 2018
    • March 2018
    • February 2018
    • January 2018
    • December 2017
    • November 2017
    • October 2017
    • September 2017
    • August 2017
    • June 2017
    • May 2017
    • April 2017
    • February 2017
    • January 2017

    Categories

    • Education
    • IP & Standards
    • Press releases
    • Scientific events
    • Uncategorized
    • Workshops

    Meta

    • Log in
    • Entries RSS
    • Comments RSS
    • WordPress.org
    Copyright © 2019 Reference Project – OnePress theme by FameThemes